Semiconductor field

In the precision manufacturing of the semiconductor industry, filters are becoming a key tool for breaking through bottlenecks in nanoscale processes with their precise spectral modulation capabilities. Linear gradient filters, biochemical filters and fluorescent filters provide revolutionary solutions for chip manufacturing, inspection and packaging with their unique optical properties.

Linear graduated filtersDemonstrate the advantages of dynamic dimming in the lithography process. Its continuous gradient film layer design can realize the precise distribution of exposure energy, just like adding "intelligent dimming system" to the photolithography machine. In 5nm chip manufacturing, the gradient filter effectively eliminates the edge diffraction effect by balancing the attenuation of deep ultraviolet (DUV) light intensity and improves the gate linewidth uniformity of finned field effect transistors (FinFETs) by 401TP3 T. In addition, the gradient filter optimizes the energy density distribution of laser soldering in advanced packaging technology and ensures sub-micron soldering precision of micro-bumps in 3D packages. micron level.

Biochemical filtersWith its highly selective wavelength transmission characteristics, it has become a "molecular probe" for semiconductor material detection. 2024 TSMC developed a wafer defect detection system in which customized 193nm narrowband filters accurately capture hydrocarbon residues on the surface of silicon wafers, combined with photoluminescence technology to achieve qualitative analysis of contamination in a single atomic layer. These filters act as miniature spectroscopic laboratories that help breakthroughs in the research and development of third-generation semiconductor materials by separating the characteristic emission spectra of elements such as phosphorus and boron during the doping process, and monitoring the concentration of ion implantation in real time.

fluorescent filterIn turn, it has made its mark in chip packaging and reliability testing. Its dual-band design can synchronize the acquisition of excitation light and fluorescence signals to give "fluorescence fingerprints" to microstructures such as solder joints and bonding wires. In the failure analysis of automotive-grade chips, the fluorescence filter set captures intermetallic compound luminescence under 254nm laser excitation, and combines with AI algorithms to realize three-dimensional reconstruction of nanoscale cracks. In addition, in quantum dot display technology, the customized 525nm filter can enhance the luminous efficiency of quantum dots, enabling the color gamut coverage of Mini-LED backlight modules to exceed 120% NTSC.

With the maturity of ion beam sputtering technology, the laser damage threshold of filters has exceeded 20J/cm², which can withstand the harsh environment of extreme ultraviolet (EUV) lithography. In the future, the intelligent filtering system integrated with microfluidic chips may realize real-time spectral tuning, promoting semiconductor manufacturing from experience-driven to data-accurate tuning, and opening up new paths for cutting-edge fields such as 6G chips and quantum computing.